E3500
SiC Defect Inspection
Defect inspection tool for SiC substrates/epitaxial wafers; integrates DIC BF and laser scattering DF for surface defect inspection and laser power source for PL excitation; AI algorithms for defect classifications; 60 nm minimum sensitivity
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Integrates DIC bright field, laser scattering dark field & dual-laser PL for SiC wafer defect coverage
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AI classification and high accuracy
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High throughput with 60nm sensitivity, suitable for SiC mass production
