E500
Macro Defect Inspection System
The E500 is designed for macro defect inspection of SiC substrates (processing process) and SiC epitaxial wafers. Equipped with dual-sided optical systems, it enables in-situ simultaneous inspection, paired with multiple lighting modes to identify various defects at once
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SiC substrates: Accurately detects macro defects including contamination, micropipes, cracks, polycrystals, polytypes, deep scratches, edge chips, hexagonal holes, white spots, and inclusions
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SiC epitaxial wafers: Precisely measures macro defects such as contamination, cracks, polycrystals, polytypes, scratches, abrasions, edge carbonization, edge deposition, haze, disc marks, edge chips, hexagonal holes, and black spots
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Intelligent classification algorithm: Integrated with deep learning and neural network algorithms for accurate defect categorization
